Multi-assembled nanotemplates via block copolymer lithography

Abstract

We presented the new morphology of polystyrene-block-poly(methyl methacrylate) copolymer thin film according to the multi-assemble process. In this work, large molecular weight PS-b-PMMA film was used as a topographical confinement by selective PMMA etching and then small molecular weight PS-b-PMMA thin film can be applied previous one. The final morphology of multi-assembled PS-b-PMMA copolymer thin films were formed into perpendicular nanopatterns such as dotted line, bilinear dots, irregular lamellar structure with alternating differing lines, shrunk cylinder patterns, composed of only organic components. These results can potentially be utilized in various nanopattern applications, including nanolithography, photonic materials, and templates for harvesting metal or inorganic materials. Furthermore, we demonstrated the new strategy for rapid annealing process for directed self-assembly of PS-b-PMMA. This work provides important insights for optimizing the annealing process of PS-b-PMMA block copolymers thin film.