Thiophene-based boron chelators and the modeling of VX-metal ion chelation

Abstract

We have explored novel metal chelation units that utilize stabilizing internal hydrogen bonding networks as in the 2,3-dihydroxy-terephthalamide type chelation units. Three novel 3,4-dihydroxy-2,5-dicarboxy-thiophene systems: 5-hexylcarbamoyl-3,4-dihydroxy-thiophene-2-carboxylic acid methyl ester (5), 3-benzyloxy-4-hydroxy-thiophene-2,5-dicarboxylic acid bis-hexylamide (6), and 3,4-dihydroxy-thiophene-2, 5-dicarboxylic acid bis-hexylamide (7) were prepared. Boron chelation with these units has also been performed and characterized.