Chemical reactions and adsorption geometries of pyrrole on Ge(100)Ge(100) 표면 위에서 pyrrole 분자의 화학반응과 흡착구조에 관한 연구

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The adsorption structures of pyrrole ($C_4H_5N$) on the Ge(lOO) surface at various coverages have been investigated by scanning tunneling microscopy (STM). Pyrrole molecule binds to a on Ge-Ge dimer via Ge-N covalent linkage through the dissociation of N-H or α-C-H bond. However, if there is pre-adsorbed H atoms on the Ge(lOO) surface, the dissociated H atom is likely to adsorb on the neighboring Ge dimer atom where the pre-adsorbed H atoms located and thus the H-dissociated pyrrole binds to the adjacent Ge dimer of the doubly H-occupied dimer. In addition, we may conclude that the H-dissociated pyrrole diffuses toward the stable adsorption site after N-H or α-C-H bond dissociation. Among the adsorption geometries, N-end-on configuration induced by the N-H dissociation is dominant above 0.1 ML. At the saturation coverage, the pyrrole molecules bind to every dimer to form a ordered P(2\times2) structure.
Advisors
Kim, Se-Hunresearcher김세훈researcher
Description
한국과학기술원 : 화학과,
Publisher
한국과학기술원
Issue Date
2004
Identifier
237873/325007  / 020023611
Language
eng
Description

학위논문(석사) - 한국과학기술원 : 화학과, 2004.2, [ vi, 32 p. ]

Keywords

STM; SURFACE; GE(100); PYRROLE; ADSORPTION; 확산; 표면 흡착; 반도체 표면; 주사터널링 현미경; 게르마늄

URI
http://hdl.handle.net/10203/31987
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=237873&flag=dissertation
Appears in Collection
CH-Theses_Master(석사논문)
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