(The) encapsulation of electroluminescent materials and photo-patterning using β-cyclodextrin

Abstract

By using inclusion chemistry, low molecular weight electroluminescent materials such as 8-hydroxy-quinoline derivative-metal complexes ($ZnQ_2$, $MgQ_2$, $AlQ_3$) were encapsulated by t-BOC protected β -cyclodextrin. For synthesis, first 8-hydroxyquinoline was included into cyclodextrin cavity by co-precipitation method. After -OH groups of cyclodextrin were protected, coordination with Zn, Mg, Al was followed. The obtained products were characterized using FT-IR spectroscopy, UV-vis spectroscopy, TGA, photoluminescence (PL) spectroscopy. The products showed increased solubility in common oranic solvent, so can be processed by solution method like spin coating, and also maintained similar photoluminescence properties. By using photo-resist type properties of y-butyl group, these materials were coated silicon wafer well, and patterned through simple photo-lithographic process. Because of their high absorbance and basicity of pyridinyl side of quinoline, these materials needed longer exposure time, more amount of PAG (photo-acid-generator) for patterning.