High-Field Electron Transport and High Saturation Velocity in Multilayer Indium Selenide Transistors

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dc.contributor.authorSeok, Yongwookko
dc.contributor.authorJang, Hanbyeolko
dc.contributor.authorChoi, Yitaekko
dc.contributor.authorKo, Yeonghyeonko
dc.contributor.authorKim, Minjeko
dc.contributor.authorIm, Heungsoonko
dc.contributor.authorWatanabe, Kenjiko
dc.contributor.authorTaniguchi, Takashiko
dc.contributor.authorSeol, Jae Hunko
dc.contributor.authorChee, Sang-Sooko
dc.contributor.authorNah, Junghyoko
dc.contributor.authorLee, Kayoungko
dc.date.accessioned2024-06-07T06:00:10Z-
dc.date.available2024-06-07T06:00:10Z-
dc.date.created2024-06-07-
dc.date.created2024-06-07-
dc.date.issued2024-03-
dc.identifier.citationACS NANO, v.18, no.11, pp.8099 - 8106-
dc.identifier.issn1936-0851-
dc.identifier.urihttp://hdl.handle.net/10203/319662-
dc.description.abstractCreating a high-frequency electron system demands a high saturation velocity (upsilon(sat)). Herein, we report the high-field transport properties of multilayer van der Waals (vdW) indium selenide (InSe). The InSe is on a hexagonal boron nitride substrate and encapsulated by a thin, noncontinuous In layer, resulting in an impressive electron mobility reaching 2600 cm(2)/(V s) at room temperature. The high-mobility InSe achieves upsilon(sat) exceeding 2 x 10(7) cm/s, which is superior to those of other gapped vdW semiconductors, and exhibits a 50-60% improvement in upsilon(sat) when cooled to 80 K. The temperature dependence of upsilon(sat) suggests an optical phonon energy ((h) over bar omega(op)) for InSe in the range of 23-27 meV, previously reported values for InSe. It is also notable that the measured upsilon(sat) values exceed what is expected according to the optical phonon emission model due to weak electron-phonon scattering. The superior upsilon(sat) of our InSe, despite its relatively small (h) over bar omega(op), reveals its potential for high-frequency electronics, including applications to control cryogenic quantum computers in close proximity.-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.titleHigh-Field Electron Transport and High Saturation Velocity in Multilayer Indium Selenide Transistors-
dc.typeArticle-
dc.identifier.wosid001181207800001-
dc.identifier.scopusid2-s2.0-85187325377-
dc.type.rimsART-
dc.citation.volume18-
dc.citation.issue11-
dc.citation.beginningpage8099-
dc.citation.endingpage8106-
dc.citation.publicationnameACS NANO-
dc.identifier.doi10.1021/acsnano.3c11613-
dc.contributor.localauthorLee, Kayoung-
dc.contributor.nonIdAuthorSeok, Yongwook-
dc.contributor.nonIdAuthorJang, Hanbyeol-
dc.contributor.nonIdAuthorChoi, Yitaek-
dc.contributor.nonIdAuthorKo, Yeonghyeon-
dc.contributor.nonIdAuthorKim, Minje-
dc.contributor.nonIdAuthorIm, Heungsoon-
dc.contributor.nonIdAuthorWatanabe, Kenji-
dc.contributor.nonIdAuthorTaniguchi, Takashi-
dc.contributor.nonIdAuthorSeol, Jae Hun-
dc.contributor.nonIdAuthorChee, Sang-Soo-
dc.contributor.nonIdAuthorNah, Junghyo-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorindium selenide-
dc.subject.keywordAuthormobility-
dc.subject.keywordAuthorcurrent saturation-
dc.subject.keywordAuthorsaturation velocity-
dc.subject.keywordAuthoroptical phonon-
dc.subject.keywordPlusMETAL-INSULATOR-TRANSITION-
dc.subject.keywordPlusMONOLAYER MOS2-
dc.subject.keywordPlusMOBILITY-
dc.subject.keywordPlusGAN-
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