Method of fabrication and control of nano-structure array by angle-resolved exposure in proximity-field nano patterning노광 각도가 조절된 근접장 패터닝을 이용한 나노구조의 조절 및 제작
A method for fabricating a nano-structure includes: providing a phase mask having an uneven lattice structure to contact a photoresist film; exposing the photoresist film to a light through the phase mask such that the light is obliquely incident on a surface of the photoresist film; and developing the photoresist film to form a nano-structure.