DC Field | Value | Language |
---|---|---|
dc.contributor.author | Choi, Jinsu | ko |
dc.contributor.author | Kim, Geehong | ko |
dc.contributor.author | Lee, Wonsup | ko |
dc.contributor.author | Cho, Hyunmin | ko |
dc.contributor.author | Chang, Won Seok | ko |
dc.contributor.author | Yoo, Hongki | ko |
dc.date.accessioned | 2024-01-05T05:00:54Z | - |
dc.date.available | 2024-01-05T05:00:54Z | - |
dc.date.created | 2024-01-04 | - |
dc.date.issued | 2023-01-31 | - |
dc.identifier.citation | SPIE Photonics West 2023 | - |
dc.identifier.uri | http://hdl.handle.net/10203/317441 | - |
dc.language | English | - |
dc.publisher | SPIE | - |
dc.title | Maskless lithography based on a digital micromirror device with improved patterning speed and quality | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | SPIE Photonics West 2023 | - |
dc.identifier.conferencecountry | US | - |
dc.identifier.conferencelocation | San Francisco, CA | - |
dc.contributor.localauthor | Yoo, Hongki | - |
dc.contributor.nonIdAuthor | Kim, Geehong | - |
dc.contributor.nonIdAuthor | Lee, Wonsup | - |
dc.contributor.nonIdAuthor | Cho, Hyunmin | - |
dc.contributor.nonIdAuthor | Chang, Won Seok | - |
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