DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jeon, HaeWon | ko |
dc.contributor.author | Jang, Jaedong | ko |
dc.contributor.author | Kang, Hohyung | ko |
dc.contributor.author | Jung, Hee-Tae | ko |
dc.date.accessioned | 2024-01-04T02:00:55Z | - |
dc.date.available | 2024-01-04T02:00:55Z | - |
dc.date.created | 2023-12-28 | - |
dc.date.issued | 2023-11-03 | - |
dc.identifier.citation | International Conference on Advanced Electromaterials 2023 | - |
dc.identifier.uri | http://hdl.handle.net/10203/317327 | - |
dc.language | English | - |
dc.publisher | International Conference on Advanced Electromaterials | - |
dc.title | New Approach for Patterning of Metal-Organic Framework Using Secondary Sputtering Lithography | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | International Conference on Advanced Electromaterials 2023 | - |
dc.identifier.conferencecountry | KO | - |
dc.identifier.conferencelocation | Ramada Plaza Jeju Hotel | - |
dc.contributor.localauthor | Jung, Hee-Tae | - |
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