Characterization of Vat Photopolymerization Additively Manufactured CMP Pads
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Dong Geun | ko |
| dc.contributor.author | Kim, Sanha | ko |
| dc.date.accessioned | 2024-01-03T11:00:25Z | - |
| dc.date.available | 2024-01-03T11:00:25Z | - |
| dc.date.created | 2023-12-30 | - |
| dc.date.issued | 2023-11-01 | - |
| dc.identifier.citation | International Conference on Planarization/CMP Technology, ICPT 2023 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/317313 | - |
| dc.language | English | - |
| dc.publisher | International Conference on Planarization Technology (ICPT) | - |
| dc.title | Characterization of Vat Photopolymerization Additively Manufactured CMP Pads | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | International Conference on Planarization/CMP Technology, ICPT 2023 | - |
| dc.identifier.conferencecountry | JA | - |
| dc.identifier.conferencelocation | Kanazawa | - |
| dc.contributor.localauthor | Kim, Sanha | - |
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