Multi-Array Nanopattern Electric-Nose (E-Nose) via High-Resolution Top-Down Lithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kang, Hohyung | ko |
| dc.contributor.author | Cho, Soo-Yeon | ko |
| dc.contributor.author | Choi, JungHoon | ko |
| dc.contributor.author | Jung, Hee-Tae | ko |
| dc.date.accessioned | 2024-01-03T06:02:48Z | - |
| dc.date.available | 2024-01-03T06:02:48Z | - |
| dc.date.created | 2023-12-28 | - |
| dc.date.issued | 2019-12-07 | - |
| dc.identifier.citation | The 32nd International Symposium on Chemical Engineering, ISChe 2019 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/317289 | - |
| dc.language | English | - |
| dc.publisher | Korean Institute of Chemical Engineers | - |
| dc.title | Multi-Array Nanopattern Electric-Nose (E-Nose) via High-Resolution Top-Down Lithography | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | The 32nd International Symposium on Chemical Engineering, ISChe 2019 | - |
| dc.identifier.conferencecountry | KO | - |
| dc.identifier.conferencelocation | Chungnam National University | - |
| dc.contributor.localauthor | Jung, Hee-Tae | - |
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