Block Copolymer Nanopatterning for Semiconductor & Non-semiconductor Applications
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Sang Ouk | ko |
| dc.date.accessioned | 2024-01-03T06:02:36Z | - |
| dc.date.available | 2024-01-03T06:02:36Z | - |
| dc.date.created | 2023-12-28 | - |
| dc.date.issued | 2023-06-30 | - |
| dc.identifier.citation | The 40th International Conference of Photopolymer Science and Technology | - |
| dc.identifier.uri | http://hdl.handle.net/10203/317288 | - |
| dc.language | English | - |
| dc.publisher | THE CHEMICAL SOCIETY OF JAPAN | - |
| dc.title | Block Copolymer Nanopatterning for Semiconductor & Non-semiconductor Applications | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | The 40th International Conference of Photopolymer Science and Technology | - |
| dc.identifier.conferencecountry | JA | - |
| dc.identifier.conferencelocation | Makuhari | - |
| dc.contributor.localauthor | Kim, Sang Ouk | - |
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