Secondary Sputtering Lithography
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Jung, Hee-Tae | ko |
| dc.date.accessioned | 2024-01-02T08:01:24Z | - |
| dc.date.available | 2024-01-02T08:01:24Z | - |
| dc.date.created | 2023-12-28 | - |
| dc.date.issued | 2023-11-15 | - |
| dc.identifier.citation | 4th KAIST Emerging Materials Symposium | - |
| dc.identifier.uri | http://hdl.handle.net/10203/317209 | - |
| dc.language | English | - |
| dc.publisher | KAIST | - |
| dc.title | Secondary Sputtering Lithography | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 4th KAIST Emerging Materials Symposium | - |
| dc.identifier.conferencecountry | KO | - |
| dc.identifier.conferencelocation | KAIST, Daejeon | - |
| dc.contributor.localauthor | Jung, Hee-Tae | - |
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