Advanced Polishing Technology Using Vertically Aligned Carbon Nanotube Thin Films

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dc.contributor.authorKang, Sukkyungko
dc.contributor.authorJung, Jihoonko
dc.contributor.authorKim, Sanhako
dc.date.accessioned2024-01-02T02:03:14Z-
dc.date.available2024-01-02T02:03:14Z-
dc.date.created2023-12-30-
dc.date.issued2023-07-10-
dc.identifier.citation2023 Advanced Epitaxy for Freestanding Membranes and 2D Materials (AEFM)-
dc.identifier.urihttp://hdl.handle.net/10203/317141-
dc.languageEnglish-
dc.publisherMassachusetts Institute of Technology-
dc.titleAdvanced Polishing Technology Using Vertically Aligned Carbon Nanotube Thin Films-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname2023 Advanced Epitaxy for Freestanding Membranes and 2D Materials (AEFM)-
dc.identifier.conferencecountryKO-
dc.identifier.conferencelocationCOEX, Seoul-
dc.contributor.localauthorKim, Sanha-
dc.contributor.nonIdAuthorJung, Jihoon-
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ME-Conference Papers(학술회의논문)
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