DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kang, Sukkyung | ko |
dc.contributor.author | Jung, Jihoon | ko |
dc.contributor.author | Kim, Sanha | ko |
dc.date.accessioned | 2024-01-02T02:03:14Z | - |
dc.date.available | 2024-01-02T02:03:14Z | - |
dc.date.created | 2023-12-30 | - |
dc.date.issued | 2023-07-10 | - |
dc.identifier.citation | 2023 Advanced Epitaxy for Freestanding Membranes and 2D Materials (AEFM) | - |
dc.identifier.uri | http://hdl.handle.net/10203/317141 | - |
dc.language | English | - |
dc.publisher | Massachusetts Institute of Technology | - |
dc.title | Advanced Polishing Technology Using Vertically Aligned Carbon Nanotube Thin Films | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | 2023 Advanced Epitaxy for Freestanding Membranes and 2D Materials (AEFM) | - |
dc.identifier.conferencecountry | KO | - |
dc.identifier.conferencelocation | COEX, Seoul | - |
dc.contributor.localauthor | Kim, Sanha | - |
dc.contributor.nonIdAuthor | Jung, Jihoon | - |
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