Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses

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dc.contributor.authorPark, Jae Hongko
dc.contributor.authorJang, Hyun Ikko
dc.contributor.authorPark, Junyongko
dc.contributor.authorJeon, Seokwooko
dc.contributor.authorKim, Woo Choongko
dc.contributor.authorKim, Hee Yeounko
dc.contributor.authorAhn, Chi Wonko
dc.date.accessioned2023-11-01T11:00:20Z-
dc.date.available2023-11-01T11:00:20Z-
dc.date.created2023-11-01-
dc.date.issued2015-02-
dc.identifier.citationAlternative Lithographic Technologies VII-
dc.identifier.issn0277-786X-
dc.identifier.urihttp://hdl.handle.net/10203/314049-
dc.description.abstractThe methodology suggested in this research provides the great possibility of creating nanostructures composed of various materials, such as soft polymer, hard polymer, and metal, as well as Si. Such nanostructures are required for a vast range of optical and display devices, photonic components, physical devices, energy devices including electrodes of secondary batteries, fuel cells, solar cells, and energy harvesters, biological devices including biochips, biomimetic or biosimilar structured devices, and mechanical devices including micro- or nano-scale sensors and actuators.-
dc.languageEnglish-
dc.publisherSPIE-
dc.titleAdvanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses-
dc.typeConference-
dc.identifier.wosid000354204900043-
dc.identifier.scopusid2-s2.0-84931332074-
dc.type.rimsCONF-
dc.citation.publicationnameAlternative Lithographic Technologies VII-
dc.identifier.conferencecountryUS-
dc.identifier.conferencelocationSan Jose, CA-
dc.identifier.doi10.1117/12.2080980-
dc.contributor.localauthorJeon, Seokwoo-
dc.contributor.nonIdAuthorPark, Jae Hong-
dc.contributor.nonIdAuthorJang, Hyun Ik-
dc.contributor.nonIdAuthorKim, Woo Choong-
dc.contributor.nonIdAuthorKim, Hee Yeoun-
dc.contributor.nonIdAuthorAhn, Chi Won-
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MS-Conference Papers(학술회의논문)
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