Manufacture and experiment of a compliant parallel XY nano-positioning stage for high dynamic performance

Abstract

Nano- positioning stage has been researched for many years and developed in various forms. This paper reports manufacture and experiment of a novel compliant parallel XY nano-position stage. The nano-positioning stage has two bridge amplification mechanisms to improve working range of the stage, double four bar mechanisms and two parallelograms to guide X and Y directional motions suppressing parasitic motions. The nano-positioning stage was manufactured with optimized geometrical dimensions. Voltage amplifiers which apply voltage to actuators, sensor drivers and digital signal processing controller were set up for experiments. Resolutions, working range and runout of yaw motion were measured by the installed system. Resolutions of 3nm for both X and Y axes, working range of 120μm for both axes and runout of yaw motion of 9 μrad (X axis) and 14.5μrad(Y axis) were measured.