Concurrent inverse design of structured light and metasurface for nanopatterning process
We demonstrate an adjoint-based concurrent optimization method for an incident wavefront and metasurface pair that can outperform the previous metasurfaces used for interference-based nanofabrication processes.
- Issue Date
- 2022-10
- Language
- English
- Citation
Frontiers in Optics, FiO 2022
- Appears in Collection
- MS-Conference Papers(학술회의논문)
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