DC Field | Value | Language |
---|---|---|
dc.contributor.author | Hur, Jae | ko |
dc.contributor.author | Kang, Dongsuk | ko |
dc.contributor.author | Moon, Dong-Il | ko |
dc.contributor.author | Yu, Jiman | ko |
dc.contributor.author | Choi, Yang-Kyu | ko |
dc.contributor.author | Shimeng, Yu | ko |
dc.date.accessioned | 2023-06-23T03:00:59Z | - |
dc.date.available | 2023-06-23T03:00:59Z | - |
dc.date.created | 2023-04-25 | - |
dc.date.created | 2023-04-25 | - |
dc.date.issued | 2023-06 | - |
dc.identifier.citation | ADVANCED ELECTRONIC MATERIALS, v.9, no.6 | - |
dc.identifier.issn | 2199-160X | - |
dc.identifier.uri | http://hdl.handle.net/10203/308699 | - |
dc.description.abstract | Cryogenic-computing draws attention due to its variety of applications such as cloud-computing, aerospace electronics, and quantum computing. Low temperature (e.g., 77 K) enables higher switching speed, improved reliability, and suppressed noise. Although cryogenic dynamic random-access memory is studied, the cryogenic NAND flash is not explored intensively. Herein, a cryogenic storage memory based on the charge-trap mechanism is reported. By removing the tunneling oxide from the conventional silicon/oxide/nitride/oxide/silicon (SONOS)-type flash memory (therefore becoming silicon/oxide/nitride/silicon (SONS)), high-speed and low-power operation is aimed to be achieved while relieved from poor retention issue thanks to the cryogenic environment. The FinFET-structured SONS memory device is demonstrated experimentally with gate length of 20–30 nm, which can achieve the retention issue (>10 years) with low voltage (≈6.5 V) and high speed (≈5 µs) operation at 77 K. To have a holistic system-level evaluation, benchmark simulation of an interface between a host microprocessor and solid-state-drive is conducted, considering the refrigerator cooling cost and the heat loss via cables across two temperatures (300 and 77 K). The results show that the SONS-type cryogenic storage system shows over 81% improvement in both latency and power, compared to the SONOS counterpart located at cryogenics. | - |
dc.language | English | - |
dc.publisher | WILEY | - |
dc.title | Cryogenic Storage Memory with High-Speed, Low-Power, and Long-Retention Performance | - |
dc.type | Article | - |
dc.identifier.wosid | 000969658400001 | - |
dc.identifier.scopusid | 2-s2.0-85152684295 | - |
dc.type.rims | ART | - |
dc.citation.volume | 9 | - |
dc.citation.issue | 6 | - |
dc.citation.publicationname | ADVANCED ELECTRONIC MATERIALS | - |
dc.identifier.doi | 10.1002/aelm.202201299 | - |
dc.contributor.localauthor | Choi, Yang-Kyu | - |
dc.contributor.nonIdAuthor | Kang, Dongsuk | - |
dc.contributor.nonIdAuthor | Shimeng, Yu | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | charge-trap memory | - |
dc.subject.keywordAuthor | cryogenic | - |
dc.subject.keywordAuthor | endurance | - |
dc.subject.keywordAuthor | flash memory | - |
dc.subject.keywordAuthor | retention | - |
dc.subject.keywordAuthor | silicon-oxide-nitride-oxide-silicon (SONOS) | - |
dc.subject.keywordAuthor | simulation program with integrated circuit emphasis (SPICE) | - |
dc.subject.keywordAuthor | tunneling | - |
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