Method for enhancing the patterning speed and precision in DMD-based maskless lithography

Abstract

Recently, many studies are utilizing a digital micromirror device (DMD) in maskless lithography due to its simple configuration and high flexibility. However, due to the trade-off relationship between pixel size and exposure area, it is challenging to achieve high resolution and high patterning speed at the same time, which hinders the wider application of the DMD maskless lithography. To overcome the disadvantage of DMD lithography, we developed a method for enhancing the speed and resolution by combining two methods, pulse exposure and oblique scanning. The pulse exposure method increases the scanning speed up to the DMD damage threshold rather than the limit of frame rate. The oblique scanning method enhances the patterning precision by distributing projected pixels at tiny intervals. Combining the two methods is accomplished by a novel parameter selection method based on numerical simulations. Results of actual patterning experiments using our method demonstrated the enhancement of speed and resolution in DMD lithography.