DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lim, Koeng-Su | ko |
dc.contributor.author | Jeon, Jin-wan | ko |
dc.contributor.author | Yoon, Jun-bo | ko |
dc.date.accessioned | 2022-12-26T03:00:37Z | - |
dc.date.available | 2022-12-26T03:00:37Z | - |
dc.identifier.uri | http://hdl.handle.net/10203/303688 | - |
dc.description.abstract | A method of fabricating a polymer or resist pattern over a substrate includes coating a photosensitive polymer or resist over the substrate to form a polymer or resist layer, determining a portion of the polymer or resist layer to be exposed to light, placing a light adjusting layer in an optical path of light shone on the polymer or resist layer, and adjusting the light adjusting layer to adjust a direction or intensity of the light shone on the polymer or resist layer. Based on the method, it is easy to fabricate a polymer or resist pattern, a metal film pattern, metal pattern structure, and a polymer mold, each having three-dimensional structures with various slopes or shapes by adjusting a direction or intensity of incident light when performing a lithography process. | - |
dc.title | Polymer or resist pattern, and metal film pattern, metal pattern and plastic mold using the same and preparation method thereof | - |
dc.title.alternative | 폴리머 또는 레지스트 패턴, 그리고 금속막 패턴, 금속 패턴, 그리고 이것을 이용한 플라스틱 금형 및 그 제조 방법 | - |
dc.type | Patent | - |
dc.type.rims | PAT | - |
dc.contributor.localauthor | Lim, Koeng-Su | - |
dc.contributor.nonIdAuthor | Jeon, Jin-wan | - |
dc.contributor.nonIdAuthor | Yoon, Jun-bo | - |
dc.contributor.assignee | KAIST | - |
dc.identifier.iprsType | 특허 | - |
dc.identifier.patentApplicationNumber | 200680012357.5 | - |
dc.identifier.patentRegistrationNumber | 100536072 | - |
dc.date.application | 2007-10-15 | - |
dc.date.registration | 2009-09-02 | - |
dc.publisher.country | CC | - |
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