Optimization of deep reactive ion etching for micrometer and sub-micrometer silicon hole arrays with high aspect ratio
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 김태영 | ko |
| dc.contributor.author | 이정철 | ko |
| dc.date.accessioned | 2022-11-29T10:01:28Z | - |
| dc.date.available | 2022-11-29T10:01:28Z | - |
| dc.date.created | 2022-11-28 | - |
| dc.date.issued | 2022-04-07 | - |
| dc.identifier.citation | 2022, 제24회 한국 MEMS 학술대회 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/301281 | - |
| dc.language | English | - |
| dc.publisher | 마이크로나노시스템학회 | - |
| dc.title | Optimization of deep reactive ion etching for micrometer and sub-micrometer silicon hole arrays with high aspect ratio | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 2022, 제24회 한국 MEMS 학술대회 | - |
| dc.identifier.conferencecountry | KO | - |
| dc.identifier.conferencelocation | 제주 부영호텔 | - |
| dc.contributor.localauthor | 이정철 | - |
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