Doping Engineering through NH3 Plasma Treatment for Threshold Voltage Control of MOCVD-Grown MoS2 Thin-Film Transistor
- Publisher
- Phantoms Foundation
- Issue Date
- 2022-07-05
- Language
- English
- Citation
Graphene 2022
- Appears in Collection
- EE-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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