Formation of periodic nano array using self assembly of supramolecular dendrimer with hexagonal cylinder structure

Abstract

Continued advances in technologies such as magnetic storage and phtoelectronics depend crucially on the ability to produce ultrahigh-density arrays of nanometer-scale elements. As critical device dimensions shrink to the nanometer scale, the fabrication of well-ordered arrays becomes increasingly difficult. In general, feature sizes greater than 100nm are routinely produced by photolithography techniques. For feature sized smaller than100nm, Advanced lithographic techniques currently being explored for this regime include extreme UV (EUV), electron beam lithography, soft X-ray lithography and focused ion beam lithography are commonly used. However, feature sizes less than 30 nm are not easily obtained by above methods. Recently, self-assembly in synthetic materials such as block copolymer, colloid, supramolecules as a means of nanopatterning for nano-sized template has also been proposed. The structural analysis and nano-fabrication methods about block copolymer and colloids self assembly are almost proved. But in the case of supramolecules, even though there is some progress in structual analysis , the nano fabrication methods is not established. In this study, the suramolecular thin film that has large single domain is prepared by carbon coated mica methods. By using the sandwiched glass cell, we obtained the homeotropic alignment of supramolecular cylinder. Using transmission electron microcopy(TEM) we confirm the structure of thin film. Then we introduced the etching selectivity to nanoscopic structure of supramolecular cylindrical structure by staining with $RuO_4$ that selectively adsorption in the core of cylinder. And we showed the possibility of supramolecular nano structure as a template for nanolithography by optimizing the experimental condition of etching process.