Nondestructive Photopatterning of Heavy-Metal-Free Quantum Dots

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dc.contributor.authorYang, Jeehyeko
dc.contributor.authorLee, Myeongjaeko
dc.contributor.authorPark, Se Youngko
dc.contributor.authorPark, Myoungjinko
dc.contributor.authorKim, Jonghoonko
dc.contributor.authorSitapure, Niranjanko
dc.contributor.authorHahm, Donghyoko
dc.contributor.authorRhee, Seunghyunko
dc.contributor.authorLee, Daeyeonko
dc.contributor.authorJo, Hyunwooko
dc.contributor.authorJo, Yong Hyunko
dc.contributor.authorLim, Jaeminko
dc.contributor.authorKim, Jungwookko
dc.contributor.authorShin, Tae Jooko
dc.contributor.authorLee, Doh Changko
dc.contributor.authorKwak, Kyungwonko
dc.contributor.authorKwon, Joseph S.ko
dc.contributor.authorKim, BongSooko
dc.contributor.authorBae, Wan Kiko
dc.contributor.authorKang, Moon Sungko
dc.date.accessioned2022-11-04T06:01:17Z-
dc.date.available2022-11-04T06:01:17Z-
dc.date.created2022-10-04-
dc.date.created2022-10-04-
dc.date.created2022-10-04-
dc.date.issued2022-10-
dc.identifier.citationADVANCED MATERIALS, v.34, no.43-
dc.identifier.issn0935-9648-
dc.identifier.urihttp://hdl.handle.net/10203/299304-
dc.description.abstractElectroluminescence from quantum dots (QDs) is a suitable photon source for futuristic displays offering hyper-realistic images with free-form factors. Accordingly, a nondestructive and scalable process capable of rendering multicolored QD patterns on a scale of several micrometers needs to be established. Here, nondestructive direct photopatterning for heavy-metal-free QDs is reported using branched light-driven ligand crosslinkers (LiXers) containing multiple azide units. The branched LiXers effectively interlock QD films via photo-crosslinking native aliphatic QD surface ligands without compromising the intrinsic optoelectronic properties of QDs. Using branched LiXers with six sterically engineered azide units, RGB QD patterns are achieved on the micrometer scale. The photo-crosslinking process does not affect the photoluminescence and electroluminescence characteristics of QDs and extends the device lifetime. This nondestructive method can be readily adapted to industrial processes and make an immediate impact on display technologies, as it uses widely available photolithography facilities and high-quality heavy-metal-free QDs with aliphatic ligands.-
dc.languageEnglish-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.titleNondestructive Photopatterning of Heavy-Metal-Free Quantum Dots-
dc.typeArticle-
dc.identifier.wosid000858084900001-
dc.identifier.scopusid2-s2.0-85138569814-
dc.type.rimsART-
dc.citation.volume34-
dc.citation.issue43-
dc.citation.publicationnameADVANCED MATERIALS-
dc.identifier.doi10.1002/adma.202205504-
dc.contributor.localauthorLee, Doh Chang-
dc.contributor.nonIdAuthorYang, Jeehye-
dc.contributor.nonIdAuthorLee, Myeongjae-
dc.contributor.nonIdAuthorPark, Se Young-
dc.contributor.nonIdAuthorPark, Myoungjin-
dc.contributor.nonIdAuthorKim, Jonghoon-
dc.contributor.nonIdAuthorSitapure, Niranjan-
dc.contributor.nonIdAuthorHahm, Donghyo-
dc.contributor.nonIdAuthorRhee, Seunghyun-
dc.contributor.nonIdAuthorLee, Daeyeon-
dc.contributor.nonIdAuthorJo, Hyunwoo-
dc.contributor.nonIdAuthorJo, Yong Hyun-
dc.contributor.nonIdAuthorLim, Jaemin-
dc.contributor.nonIdAuthorKim, Jungwook-
dc.contributor.nonIdAuthorShin, Tae Joo-
dc.contributor.nonIdAuthorKwak, Kyungwon-
dc.contributor.nonIdAuthorKwon, Joseph S.-
dc.contributor.nonIdAuthorKim, BongSoo-
dc.contributor.nonIdAuthorBae, Wan Ki-
dc.contributor.nonIdAuthorKang, Moon Sung-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorheavy-metal-free quantum dots-
dc.subject.keywordAuthorhigh-resolution patterning-
dc.subject.keywordAuthorligand crosslinking-
dc.subject.keywordAuthorphotopatterning-
dc.subject.keywordPlusLIGHT-EMITTING-DIODES-
dc.subject.keywordPlusDIRECT OPTICAL LITHOGRAPHY-
dc.subject.keywordPlusHIGHLY EFFICIENT-
dc.subject.keywordPlusCROSS-LINKING-
dc.subject.keywordPlusDEEP-UV-
dc.subject.keywordPlusNANOCRYSTALS-
dc.subject.keywordPlusROBUST-
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