Method for simulating semiconductor device이종접합 반도체 소자 시뮬레이션 방법

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dc.contributor.authorShin, Mincheolko
dc.contributor.authorJeon, SeongHyeokko
dc.date.accessioned2022-02-23T06:42:29Z-
dc.date.available2022-02-23T06:42:29Z-
dc.identifier.urihttp://hdl.handle.net/10203/292368-
dc.description.abstractProvided is a method for simulating a semiconductor device. The method includes extracting a Hamiltonian and an overlap matrix of a semiconductor device using a density functional theory or a tight-binding method, calculating each of Bloch states for each corresponding energy, obtaining a first reduced Hamiltonian and a first reduced overlap matrix with a reduced matrix size, and calculating a final transformation matrix and a final energy band structure in which all of unphysical branches, wherein the semiconductor device includes a source region, a drain region, and a channel region between the source region and the drain region, wherein the channel region includes unit cells, each of which includes different material or has different structure.-
dc.titleMethod for simulating semiconductor device-
dc.title.alternative이종접합 반도체 소자 시뮬레이션 방법-
dc.typePatent-
dc.type.rimsPAT-
dc.contributor.localauthorShin, Mincheol-
dc.contributor.nonIdAuthorJeon, SeongHyeok-
dc.contributor.assigneeKAIST-
dc.identifier.iprsType특허-
dc.identifier.patentApplicationNumber16951351-
dc.identifier.patentRegistrationNumber11227088-
dc.date.application2020-11-18-
dc.date.registration2022-01-18-
dc.publisher.countryUS-
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EE-Patent(특허)
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