Method of fabricating rigid island pattern on stretchable layer with low Young`s modulus and stretchable electronic device platform using the same낮은 영률을 가지는 신축성층 위 단단한 아일랜드 패턴의 제작 방법 및 이를 이용한 신축성 전자소자 플랫폼

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dc.contributor.authorYoo, Seunghyupko
dc.contributor.authorKim, Taehyunko
dc.contributor.authorMoon, Hanulko
dc.date.accessioned2022-01-27T06:41:30Z-
dc.date.available2022-01-27T06:41:30Z-
dc.identifier.urihttp://hdl.handle.net/10203/292048-
dc.description.abstractA method of fabricating a rigid island pattern on a stretchable layer having a low Young's modulus and a stretchable electronic device platform using the same are disclosed. The stretchable electronic device platform, which is proposed by the present disclosure and has the rigid island pattern on the stretchable layer having a low Young's modulus, includes a stretchable substrate having a first Young's modulus, a Silbione® layer coated with a stretchable layer having a Young's modulus lower than the first Young's modulus on the stretchable substrate, and a fixed layer which is made of a photoresist such as SU-8 or a UV curable resin and has a Young's modulus higher than the first Young's modulus, and in which the rigid island pattern and the meandering stretchable interconnector pattern are formed on the stretchable layer by a photolithography process.-
dc.titleMethod of fabricating rigid island pattern on stretchable layer with low Young`s modulus and stretchable electronic device platform using the same-
dc.title.alternative낮은 영률을 가지는 신축성층 위 단단한 아일랜드 패턴의 제작 방법 및 이를 이용한 신축성 전자소자 플랫폼-
dc.typePatent-
dc.type.rimsPAT-
dc.contributor.localauthorYoo, Seunghyup-
dc.contributor.nonIdAuthorKim, Taehyun-
dc.contributor.nonIdAuthorMoon, Hanul-
dc.contributor.assigneeKAIST-
dc.identifier.iprsType특허-
dc.identifier.patentApplicationNumber16234977-
dc.identifier.patentRegistrationNumber10923670-
dc.date.application2018-12-28-
dc.date.registration2021-02-16-
dc.publisher.countryUS-
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EE-Patent(특허)
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