Effects of plasma exposure on the properties of W0.5(TaTiVCr)0.5 alloy
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Waseem, Owais Ahmed | ko |
| dc.contributor.author | Ryu, Ho Jin | ko |
| dc.contributor.author | Kevin, Woller | ko |
| dc.date.accessioned | 2021-11-10T06:47:16Z | - |
| dc.date.available | 2021-11-10T06:47:16Z | - |
| dc.date.created | 2021-07-05 | - |
| dc.date.issued | 2021-10-25 | - |
| dc.identifier.citation | ICFRM-20 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/289091 | - |
| dc.language | English | - |
| dc.publisher | ICFRM-20 | - |
| dc.title | Effects of plasma exposure on the properties of W0.5(TaTiVCr)0.5 alloy | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | ICFRM-20 | - |
| dc.identifier.conferencecountry | SP | - |
| dc.identifier.conferencelocation | Virtual | - |
| dc.contributor.localauthor | Ryu, Ho Jin | - |
| dc.contributor.nonIdAuthor | Waseem, Owais Ahmed | - |
| dc.contributor.nonIdAuthor | Kevin, Woller | - |
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