Extreme-Pressure Imprint Lithography for Heat and Ultraviolet-Free Direct Patterning of Rigid Nanoscale Features

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 36
  • Download : 0
DC FieldValueLanguage
dc.contributor.authorPark, Woon Ikko
dc.contributor.authorPark, Tae Wanko
dc.contributor.authorChoi, Young Joongko
dc.contributor.authorLee, Sangryunko
dc.contributor.authorRyu, Seunghwako
dc.contributor.authorLiang, Xiaoganko
dc.contributor.authorJung, Yeon Sikko
dc.date.accessioned2021-07-19T07:10:31Z-
dc.date.available2021-07-19T07:10:31Z-
dc.date.created2021-07-19-
dc.date.issued2021-06-
dc.identifier.citationACS NANO, v.15, no.6, pp.10464 - 10471-
dc.identifier.issn1936-0851-
dc.identifier.urihttp://hdl.handle.net/10203/286736-
dc.description.abstractNanoimprint lithography (NIL) is typically performed by filling up of molds by heated polymers or UV-curable liquid resists, inevitably requiring subsequent pattern-transfer processes. Although direct NIL techniques have been suggested alternatively, they usually require precursors or ink-type resists containing undesired organic components. Here, we demonstrate extreme-pressure imprint lithography (EPIL) that effectively produces well-defined multiscale structures with a wide range from 10 nm to 10 mm on diverse surfaces even including pure or alloy metals without using any precursors, heating, UV exposure, or pattern transfer. In particular, EPIL is accomplished through precise control of room-temperature plastic deformation in nanoscale volumes, which is elucidated by finite element analyses and molecular dynamics simulations. In addition to scalability to macroscopic areas, we confirm the outstanding versatility of EPIL via its successful applications to Ni, Cu, steel, and organics. We expect that the state-of-the-art EPIL process combined with other emerging nanopatterning technologies will be extendable to the future large-area nanofabrication of various devices.-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.titleExtreme-Pressure Imprint Lithography for Heat and Ultraviolet-Free Direct Patterning of Rigid Nanoscale Features-
dc.typeArticle-
dc.identifier.wosid000665748900113-
dc.identifier.scopusid2-s2.0-85108887269-
dc.type.rimsART-
dc.citation.volume15-
dc.citation.issue6-
dc.citation.beginningpage10464-
dc.citation.endingpage10471-
dc.citation.publicationnameACS NANO-
dc.identifier.doi10.1021/acsnano.1c02896-
dc.contributor.localauthorRyu, Seunghwa-
dc.contributor.localauthorJung, Yeon Sik-
dc.contributor.nonIdAuthorPark, Woon Ik-
dc.contributor.nonIdAuthorPark, Tae Wan-
dc.contributor.nonIdAuthorChoi, Young Joong-
dc.contributor.nonIdAuthorLiang, Xiaogan-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthornanopatterning-
dc.subject.keywordAuthorimprint lithography-
dc.subject.keywordAuthornanostructure-
dc.subject.keywordAuthorstep-and-repeat-
dc.subject.keywordAuthorextreme-pressure-
dc.subject.keywordPlusDIAMOND-
dc.subject.keywordPlusNANOSTRUCTURES-
Appears in Collection
ME-Journal Papers(저널논문)MS-Journal Papers(저널논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0