Ultralow switching voltage slope based on two-dimensional materials for integrated memory and neuromorphic applications

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dc.contributor.authorSun, Linfengko
dc.contributor.authorHwang, Genuwooko
dc.contributor.authorChoi, Wooseonko
dc.contributor.authorHan, Gyeongtakko
dc.contributor.authorZhang, Yishuko
dc.contributor.authorJiang, Jinbaoko
dc.contributor.authorZheng, Shoujunko
dc.contributor.authorWatanabe, Kenjiko
dc.contributor.authorTaniguchi, Takashiko
dc.contributor.authorZhao, Maliko
dc.contributor.authorZhao, Rongko
dc.contributor.authorKim, Young-Minko
dc.contributor.authorYang, Heejunko
dc.date.accessioned2021-01-28T06:10:19Z-
dc.date.available2021-01-28T06:10:19Z-
dc.date.created2021-01-26-
dc.date.created2021-01-26-
dc.date.created2021-01-26-
dc.date.issued2020-03-
dc.identifier.citationNANO ENERGY, v.69, pp.104472-
dc.identifier.issn2211-2855-
dc.identifier.urihttp://hdl.handle.net/10203/280181-
dc.description.abstractTo realize ultrafast and energy-efficient electronic devices, reducing the switching voltage slope for ON and OFF states that scales the supply voltage and device dimensions is critical. Novel device architectures based on two-dimensional (2D) materials have overcome the fundamental thermionic limit of the switching slope (60 mV/dec); however, a versatile switching device required for highly integrated memory and neuromorphic applications has not been achieved with such exceptional switching slope characteristics. Here, we demonstrate a switching voltage slope down to 0.62 mV/dec in a threshold switching device based on a vertical heterojunction of silver/hexagonal boron nitride (h-BN)/graphene. The sub-1 mV/dec switching slope for the first time, maintaining a high ON/OFF ratio (up to 10(10)), originates from the unique coupling between the migrated silver atoms and the chemically-inert graphene electrode through the 2D insulating h-BN. Moreover, our original switching device enables the evolution from a conventional volatile (threshold switching) to non-volatile memristive state by adequate voltage spikes, which is ideal for selector applications in highly integrated crossbar array architecture and in a novel synaptic device for neuromorphic computing.-
dc.languageEnglish-
dc.publisherELSEVIER-
dc.titleUltralow switching voltage slope based on two-dimensional materials for integrated memory and neuromorphic applications-
dc.typeArticle-
dc.identifier.wosid000513814400066-
dc.identifier.scopusid2-s2.0-85077767841-
dc.type.rimsART-
dc.citation.volume69-
dc.citation.beginningpage104472-
dc.citation.publicationnameNANO ENERGY-
dc.identifier.doi10.1016/j.nanoen.2020.104472-
dc.contributor.localauthorYang, Heejun-
dc.contributor.nonIdAuthorSun, Linfeng-
dc.contributor.nonIdAuthorHwang, Genuwoo-
dc.contributor.nonIdAuthorChoi, Wooseon-
dc.contributor.nonIdAuthorHan, Gyeongtak-
dc.contributor.nonIdAuthorZhang, Yishu-
dc.contributor.nonIdAuthorJiang, Jinbao-
dc.contributor.nonIdAuthorZheng, Shoujun-
dc.contributor.nonIdAuthorWatanabe, Kenji-
dc.contributor.nonIdAuthorTaniguchi, Takashi-
dc.contributor.nonIdAuthorZhao, Mali-
dc.contributor.nonIdAuthorZhao, Rong-
dc.contributor.nonIdAuthorKim, Young-Min-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorTwo-dimensional materials-
dc.subject.keywordAuthorGraphene transistor-
dc.subject.keywordAuthorNeuromorphic devices-
dc.subject.keywordAuthorMemory device-
dc.subject.keywordAuthorSelector-
dc.subject.keywordPlusPLASTICITY-
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