Preparation of solution-processable polybenzoxazole-graphene nanocomposites for etching mask with high etching resistance = 용액공정이 가능한 폴리벤족사졸-그래핀 나노복합체의 제조 및 고식각내성 에칭 마스크 응용에 관한 연구

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In the advanced lithography processes of chip industry, the relatively deficient etching resistance and pattern distortion phenomena of spin-on hardmask (SOH) on dry etching process have emerged as new major issues. We tried to overcome the obstacles by applying the graphitic carbon materials with high mechanical strength to the SOH polymer. The graphene-polymer (nGO-FPHA) composites were prepared by chemical coupling reaction of fluorinated poly(hydroxyamide) (FPHA) and acyl-chloride-functionalized graphene oxide of submicron size (nGO). The nGO-FPHA showed stable dispersion in some organic solvents, and finally changed to rigid nRGO-FPBO under heat after spin-coating the solution on substrates. According to the investigation of nRGO-FPBO, the homogeneous dispersion and reduction of nGO sheets helped to enhance the properties and performance of composite film as much as 72 %, 56 %, and 54 % of elastic modulus, hardness, etch resistance from pure FPBO polymer, respectively. In addition, the nRGO-FPBO showed a good thermal stability below $400 \circ C$ so that the composite film can be used to high temperature processes.
Advisors
Jung, Hee-Taeresearcher정희태researcher
Description
한국과학기술원 :생명화학공학과,
Publisher
한국과학기술원
Issue Date
2016
Identifier
325007
Language
eng
Description

학위논문(석사) - 한국과학기술원 : 생명화학공학과, 2016.8,[iv, 30 p. :]

Keywords

SOH▼agraphene▼ananocomposite▼anRGO-FPBO▼aetching resistance; 회전도포▼a하드마스크▼a나노복합체▼a그래핀▼a에칭 내성

URI
http://hdl.handle.net/10203/266392
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=849890&flag=dissertation
Appears in Collection
CBE-Theses_Master(석사논문)
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