Reflection electron energy loss spectroscopy of nanometric oxide layers and of their interfaces with a substrate

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dc.contributor.authorPaumier, Fko
dc.contributor.authorFouquet, Vko
dc.contributor.authorGuittet, MJko
dc.contributor.authorGautier-Soyer, Mko
dc.contributor.authorFrench, RHko
dc.contributor.authorTan, GLko
dc.contributor.authorChiang, YMko
dc.contributor.authorTang, Mko
dc.contributor.authorRamos, Ako
dc.contributor.authorChung, Sung-Yoonko
dc.date.accessioned2019-05-15T13:27:54Z-
dc.date.available2019-05-15T13:27:54Z-
dc.date.created2019-05-14-
dc.date.issued2006-04-
dc.identifier.citationMATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, v.422, no.1-2, pp.29 - 40-
dc.identifier.issn0921-5093-
dc.identifier.urihttp://hdl.handle.net/10203/261925-
dc.description.abstractThe aim of the present work was to evaluate the ability of reflection electron energy loss spectroscopy (REELS) as a non-destructive method to obtain depth profiles of dielectric constants, in a complementary way to transmission electron energy loss spectroscopy (TEELS). Two prototypical samples were used: a SrTiO3 single crystal and a 2 nm thick SiO2 layer on a Si single crystal. The single scattering cross-sections were decomposed into bulk, surface and interface contributions, with Drude-Lorentz parameters of the dielectric function fitted on available optical or TEELS data. We show that the evolution of the shape of the REELS single scattering cross-section with primary energy is qualitatively well reproduced by our model. In the case of the 2 nm SiO2 layer on Si, introducing the Si/SiO2 interface energy loss function contribution proved necessary to account for the interface plasmon peak observed, in very good agreement with reported TEELS measurements. REELS is well suited to studying dielectric properties of interfaces between a substrate and a nanometric layer. (c) 2006 Elsevier B.V All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.titleReflection electron energy loss spectroscopy of nanometric oxide layers and of their interfaces with a substrate-
dc.typeArticle-
dc.identifier.wosid000237947800004-
dc.identifier.scopusid2-s2.0-33846421066-
dc.type.rimsART-
dc.citation.volume422-
dc.citation.issue1-2-
dc.citation.beginningpage29-
dc.citation.endingpage40-
dc.citation.publicationnameMATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING-
dc.identifier.doi10.1016/j.msea.2006.01.005-
dc.contributor.localauthorChung, Sung-Yoon-
dc.contributor.nonIdAuthorPaumier, F-
dc.contributor.nonIdAuthorFouquet, V-
dc.contributor.nonIdAuthorGuittet, MJ-
dc.contributor.nonIdAuthorGautier-Soyer, M-
dc.contributor.nonIdAuthorFrench, RH-
dc.contributor.nonIdAuthorTan, GL-
dc.contributor.nonIdAuthorChiang, YM-
dc.contributor.nonIdAuthorTang, M-
dc.contributor.nonIdAuthorRamos, A-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorelectron energy loss spectroscopy-
dc.subject.keywordAuthorsilicon oxide-
dc.subject.keywordAuthorplasmons-
dc.subject.keywordAuthorstrontium titanate-
dc.subject.keywordAuthorthin films-
dc.subject.keywordPlusDIELECTRIC LOSS FUNCTION-
dc.subject.keywordPlusMEAN FREE PATHS-
dc.subject.keywordPlusLOSS SPECTRA-
dc.subject.keywordPlusQUANTITATIVE-ANALYSIS-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusSURFACE EXCITATIONS-
dc.subject.keywordPlusBACKGROUND REMOVAL-
dc.subject.keywordPlusCROSS-SECTIONS-
dc.subject.keywordPlusREELS SPECTRA-
dc.subject.keywordPlusMODEL-
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