Dry etching technology in semiconductor process
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Woo, Seong-Ihl | ko |
| dc.date.accessioned | 2019-04-25T15:53:57Z | - |
| dc.date.available | 2019-04-25T15:53:57Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1989-01 | - |
| dc.identifier.citation | CHEMICAL ENGINEERING & TECHNOLOGY, v.7, pp.299 - 0 | - |
| dc.identifier.issn | 0930-7516 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/261597 | - |
| dc.language | English | - |
| dc.publisher | Wiley-Blackwell | - |
| dc.title | Dry etching technology in semiconductor process | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 7 | - |
| dc.citation.beginningpage | 299 | - |
| dc.citation.endingpage | 0 | - |
| dc.citation.publicationname | CHEMICAL ENGINEERING & TECHNOLOGY | - |
| dc.contributor.localauthor | Woo, Seong-Ihl | - |
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