Nano-patterning process of self-assembled monolayer via si-containing block copolymer lithography on gold substrate

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dc.contributor.author우승아ko
dc.contributor.author최수영ko
dc.contributor.author구세진ko
dc.contributor.author김진백ko
dc.date.accessioned2019-04-16T02:52:45Z-
dc.date.available2019-04-16T02:52:45Z-
dc.date.created2014-01-10-
dc.date.issued2011-04-28-
dc.identifier.citation2011 춘계 대한화학회-
dc.identifier.urihttp://hdl.handle.net/10203/260098-
dc.languageKorean-
dc.publisher대한 화학회-
dc.titleNano-patterning process of self-assembled monolayer via si-containing block copolymer lithography on gold substrate-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname2011 춘계 대한화학회-
dc.identifier.conferencecountryKO-
dc.contributor.localauthor김진백-
dc.contributor.nonIdAuthor우승아-
dc.contributor.nonIdAuthor최수영-
dc.contributor.nonIdAuthor구세진-
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CH-Conference Papers(학술회의논문)
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