A chemically amplified molecular resist containing tertiary caprolactone for EUV lithography

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dc.contributor.author정선화ko
dc.contributor.author조경천ko
dc.contributor.author김진백ko
dc.date.accessioned2019-04-16T00:32:44Z-
dc.date.available2019-04-16T00:32:44Z-
dc.date.created2014-01-10-
dc.date.issued2012-10-12-
dc.identifier.citation2012 추계 한국고분자학회-
dc.identifier.urihttp://hdl.handle.net/10203/259409-
dc.languageKorean-
dc.publisher대한 고분자 학회-
dc.titleA chemically amplified molecular resist containing tertiary caprolactone for EUV lithography-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname2012 추계 한국고분자학회-
dc.identifier.conferencecountryKO-
dc.contributor.localauthor김진백-
dc.contributor.nonIdAuthor정선화-
dc.contributor.nonIdAuthor조경천-
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CH-Conference Papers(학술회의논문)
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