DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, Geun-Myung | ko |
dc.contributor.author | Oh, Young Jun | ko |
dc.contributor.author | Chang, Kee-Joo | ko |
dc.date.accessioned | 2019-04-16T00:12:57Z | - |
dc.date.available | 2019-04-16T00:12:57Z | - |
dc.date.created | 2014-01-10 | - |
dc.date.issued | 2012-11 | - |
dc.identifier.citation | The 15th Asian Workshop on First-Principles Electronic Structure Calculations | - |
dc.identifier.uri | http://hdl.handle.net/10203/259310 | - |
dc.language | English | - |
dc.publisher | National Taiwan University | - |
dc.title | Migration pathway and barrier for B diffusion at the planar interface between Si and SiO2 | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | The 15th Asian Workshop on First-Principles Electronic Structure Calculations | - |
dc.identifier.conferencecountry | CH | - |
dc.identifier.conferencelocation | Taiwan | - |
dc.contributor.localauthor | Chang, Kee-Joo | - |
dc.contributor.nonIdAuthor | Kim, Geun-Myung | - |
dc.contributor.nonIdAuthor | Oh, Young Jun | - |
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