DC Field | Value | Language |
---|---|---|
dc.contributor.author | 심재동 | ko |
dc.contributor.author | 현도빈 | ko |
dc.contributor.author | 박찬수 | ko |
dc.date.accessioned | 2019-04-15T18:54:44Z | - |
dc.date.available | 2019-04-15T18:54:44Z | - |
dc.date.issued | 1990-03-12 | - |
dc.identifier.uri | http://hdl.handle.net/10203/257452 | - |
dc.description.abstract | 내용 없음 | - |
dc.title | 고순도훼로실리콘의제조방법 | - |
dc.title.alternative | The manufacturing method of the high purity ferrosilicon | - |
dc.type | Patent | - |
dc.type.rims | PAT | - |
dc.contributor.localauthor | 심재동 | - |
dc.contributor.nonIdAuthor | 현도빈 | - |
dc.contributor.nonIdAuthor | 박찬수 | - |
dc.contributor.assignee | 한국과학기술연구원 | - |
dc.identifier.iprsType | 특허 | - |
dc.identifier.patentApplicationNumber | 10-1986-0000381 | - |
dc.identifier.patentRegistrationNumber | 10-0032131-0000 | - |
dc.date.application | 1986-01-22 | - |
dc.date.registration | 1990-03-12 | - |
dc.publisher.country | KO | - |
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