Effect of interface Ge atoms on the segregation of B dopants in SiGe/SiO2 interface

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dc.contributor.author이창휘ko
dc.contributor.author오영준ko
dc.contributor.author김근명ko
dc.contributor.author장기주ko
dc.date.accessioned2019-04-15T18:31:12Z-
dc.date.available2019-04-15T18:31:12Z-
dc.date.created2014-01-12-
dc.date.issued2013-10-
dc.identifier.citation한국물리학회 가을 학술논문발표회-
dc.identifier.urihttp://hdl.handle.net/10203/257191-
dc.languageKorean-
dc.publisher한국물리학회-
dc.titleEffect of interface Ge atoms on the segregation of B dopants in SiGe/SiO2 interface-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname한국물리학회 가을 학술논문발표회-
dc.identifier.conferencecountryKO-
dc.contributor.localauthor장기주-
dc.contributor.nonIdAuthor이창휘-
dc.contributor.nonIdAuthor오영준-
dc.contributor.nonIdAuthor김근명-
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PH-Conference Papers(학술회의논문)
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