Electrical properties of (Bi3.5La0.5)Ti3O12 thin-films prepared by liquid source misted chemical deposition

Cited 1 time in webofscience Cited 0 time in scopus
  • Hit : 170
  • Download : 0
DC FieldValueLanguage
dc.contributor.authorChung, HJko
dc.contributor.authorChung, SJko
dc.contributor.authorJeon, MKko
dc.contributor.authorWoo, Seong-Ihlko
dc.date.accessioned2019-03-07T17:40:16Z-
dc.date.available2019-03-07T17:40:16Z-
dc.date.created2012-02-06-
dc.date.issued2006-03-
dc.identifier.citationKOREAN JOURNAL OF CHEMICAL ENGINEERING, v.23, pp.329 - 332-
dc.identifier.issn0256-1115-
dc.identifier.urihttp://hdl.handle.net/10203/250952-
dc.description.abstractThe (Bi3.5La0.5)Ti3O12 (BLT) thin-films used in this study were fabricated on a Pt(111)/SiO2/Si(100) substrate by a Liquid Source Misted Chemical Deposition (LSMCD) technique. X-ray diffraction patterns showed that the BLT films were crystallized and no other phases were observed when annealed above 650 degrees C. Grain size and remnant polarizations increased with increase in the annealing temperature, while leakage current densities decreased. The remnant polarizations (P-r) increased from 2.0 to 4.8 and 19.0 mu C/cm(2) with increase in the annealing temperature from 650 to 700 and 750 degrees C, respectively. The BLT films annealed at 700 degrees C in O-2 showed a good fatigue resistance of reduced polarization by 10% after 10(9) switching cycles when 9 V of bipolar voltage was applied at a frequency of 40 kHz.-
dc.languageEnglish-
dc.publisherKOREAN INST CHEM ENGINEERS-
dc.subjectNEUTRON POWDER DIFFRACTION-
dc.subjectVAPOR-DEPOSITION-
dc.subjectBISMUTH TITANATE-
dc.subjectREFINEMENT-
dc.subjectCAPACITORS-
dc.titleElectrical properties of (Bi3.5La0.5)Ti3O12 thin-films prepared by liquid source misted chemical deposition-
dc.typeArticle-
dc.identifier.wosid000236575000028-
dc.identifier.scopusid2-s2.0-33745661951-
dc.type.rimsART-
dc.citation.volume23-
dc.citation.beginningpage329-
dc.citation.endingpage332-
dc.citation.publicationnameKOREAN JOURNAL OF CHEMICAL ENGINEERING-
dc.contributor.localauthorWoo, Seong-Ihl-
dc.contributor.nonIdAuthorChung, HJ-
dc.contributor.nonIdAuthorChung, SJ-
dc.contributor.nonIdAuthorJeon, MK-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorliquid source misted chemical deposition-
dc.subject.keywordAuthor(Bi3.5La0.5)Ti3O12 (BLT) film-
dc.subject.keywordAuthorbismuth titanate-
dc.subject.keywordAuthorferroelectric thin-film-
dc.subject.keywordPlusNEUTRON POWDER DIFFRACTION-
dc.subject.keywordPlusVAPOR-DEPOSITION-
dc.subject.keywordPlusBISMUTH TITANATE-
dc.subject.keywordPlusREFINEMENT-
dc.subject.keywordPlusCAPACITORS-
Appears in Collection
CBE-Journal Papers(저널논문)
Files in This Item
There are no files associated with this item.
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 1 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0