DC Field | Value | Language |
---|---|---|
dc.contributor.author | Son, Jeong Gon | ko |
dc.contributor.author | Chang, Jae-Byum | ko |
dc.contributor.author | Berggren, Karl K. | ko |
dc.contributor.author | Ross, Caroline A. | ko |
dc.date.accessioned | 2018-09-18T06:25:05Z | - |
dc.date.available | 2018-09-18T06:25:05Z | - |
dc.date.created | 2018-09-04 | - |
dc.date.created | 2018-09-04 | - |
dc.date.issued | 2011-11 | - |
dc.identifier.citation | NANO LETTERS, v.11, no.11, pp.5079 - 5084 | - |
dc.identifier.issn | 1530-6984 | - |
dc.identifier.uri | http://hdl.handle.net/10203/245599 | - |
dc.description.abstract | Block copolymer self-assembly generates patterns with periodicity in the similar to 10-100 nm range and is increasingly recognized as a route to lithographic patterning beyond the resolution of photolithography. Block copolymers naturally produce periodic patterns with a morphology and length-scale determined by the molecular architecture, and considerable research has been carried out to extend the range of patterns that can be produced from a given block copolymer, but the ability to control the period of the pattern over a wide range and to achieve complex structures with mixed morphologies from a given block copolymer is limited. Here we show how patterns consisting of coexisting sub-10-nm spheres and cylinders and sphere patterns with a range of periods can be created using a combination of serial solvent anneal processes and electron-beam irradiation of selected areas of a film of poly(styrene-block-dimethylsiloxane). These techniques extend the capabilities of block copolymer lithography, enabling complex aperiodic nanoscale patterns to be formed from a single block copolymer thin film. | - |
dc.language | English | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | MICROPHASE-SEPARATION | - |
dc.subject | INTERFACIAL ENERGY | - |
dc.subject | DIBLOCK COPOLYMER | - |
dc.subject | THIN-FILMS | - |
dc.subject | GRAPHOEPITAXY | - |
dc.subject | TEMPLATES | - |
dc.subject | NANOLITHOGRAPHY | - |
dc.subject | NANOSTRUCTURES | - |
dc.subject | LITHOGRAPHY | - |
dc.subject | ORIENTATION | - |
dc.title | Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing | - |
dc.type | Article | - |
dc.identifier.wosid | 000296674700098 | - |
dc.identifier.scopusid | 2-s2.0-80755189347 | - |
dc.type.rims | ART | - |
dc.citation.volume | 11 | - |
dc.citation.issue | 11 | - |
dc.citation.beginningpage | 5079 | - |
dc.citation.endingpage | 5084 | - |
dc.citation.publicationname | NANO LETTERS | - |
dc.identifier.doi | 10.1021/nl203445h | - |
dc.contributor.localauthor | Chang, Jae-Byum | - |
dc.contributor.nonIdAuthor | Son, Jeong Gon | - |
dc.contributor.nonIdAuthor | Berggren, Karl K. | - |
dc.contributor.nonIdAuthor | Ross, Caroline A. | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article | - |
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