Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing

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Block copolymer self-assembly generates patterns with periodicity in the similar to 10-100 nm range and is increasingly recognized as a route to lithographic patterning beyond the resolution of photolithography. Block copolymers naturally produce periodic patterns with a morphology and length-scale determined by the molecular architecture, and considerable research has been carried out to extend the range of patterns that can be produced from a given block copolymer, but the ability to control the period of the pattern over a wide range and to achieve complex structures with mixed morphologies from a given block copolymer is limited. Here we show how patterns consisting of coexisting sub-10-nm spheres and cylinders and sphere patterns with a range of periods can be created using a combination of serial solvent anneal processes and electron-beam irradiation of selected areas of a film of poly(styrene-block-dimethylsiloxane). These techniques extend the capabilities of block copolymer lithography, enabling complex aperiodic nanoscale patterns to be formed from a single block copolymer thin film.
Publisher
AMER CHEMICAL SOC
Issue Date
2011-11
Language
English
Article Type
Article
Keywords

MICROPHASE-SEPARATION; INTERFACIAL ENERGY; DIBLOCK COPOLYMER; THIN-FILMS; GRAPHOEPITAXY; TEMPLATES; NANOLITHOGRAPHY; NANOSTRUCTURES; LITHOGRAPHY; ORIENTATION

Citation

NANO LETTERS, v.11, no.11, pp.5079 - 5084

ISSN
1530-6984
DOI
10.1021/nl203445h
URI
http://hdl.handle.net/10203/245599
Appears in Collection
MS-Journal Papers(저널논문)
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