리소그라피 장비에서 XYtheta 미세구동기의 최적 설계 및 제어

Abstract

The Quality of a precision product, in general, relies in the accuracy and precision of its manufacturing and inspection process. In many cases, the level of precision in the manufacturing and inspection system is also dependent on the positioning capability of tool with respect to the work piece in the process. Recently, the positioning accuracy level has reached to the level of submicron and long range of motion is required. For example, for 1GDARM lithography, 20nm accuracy and 300mm stroke meeds. This paper refers to the lithography stage especially to fine stage. In this study, for long stroke and high accuracy, the dual servo system is proposed. for the coarse actuator, LDM(Linear DC motor) is used and for fine one VCM is used. In this study, we propose the mew structure of VCM for the fine actuator. It is 3 aixs precision positioning stage for an aligner system. After we perform the optimal design of the stage to obtain the maximum force, which is related to the acceleration of the stage to accomplish throughput of product. And we controlled this fine stage with TDC. So we obtain 50nm resolution. So later more works will be done to obtain better accuracy.