DC Field | Value | Language |
---|---|---|
dc.contributor.author | Shin, Seungmin | ko |
dc.contributor.author | Woo, Seung A. | ko |
dc.contributor.author | Kim, Jin-Baek | ko |
dc.date.accessioned | 2018-04-24T06:36:11Z | - |
dc.date.available | 2018-04-24T06:36:11Z | - |
dc.date.created | 2016-12-06 | - |
dc.date.created | 2016-12-06 | - |
dc.date.issued | 2016-11 | - |
dc.identifier.citation | NANOTECHNOLOGY, v.27, no.47 | - |
dc.identifier.issn | 0957-4484 | - |
dc.identifier.uri | http://hdl.handle.net/10203/241468 | - |
dc.description.abstract | Novel polyhedral oligomeric silsesquioxane (POSS) resists, which are based on a new photo-crosslinking system via Wolff rearrangement, are developed as ideal replica mold materials for ultraviolet-nanoimprint lithography. These POSS resist materials are synthesized by incorporating diazoketo and hydroxyl groups into the POSS core. The resist materials have exhibited a variety of desirable properties as replica molds, such as high modulus, low shrinkage ratio, high transparency, low surface energy, and resistance to organic solvents. The resultant replica molds exhibit a high resolution patterning capacity. These economic fabrication methods of replica molds with high mechanical durability and good releasing properties are potentially useful for versatile applications in the area of mold-based lithography | - |
dc.language | English | - |
dc.publisher | IOP PUBLISHING LTD | - |
dc.title | Diazoketo-functionalized POSS resists for high performance replica molds of ultraviolet-nanoimprint lithography | - |
dc.type | Article | - |
dc.identifier.wosid | 000387151000001 | - |
dc.identifier.scopusid | 2-s2.0-84994591134 | - |
dc.type.rims | ART | - |
dc.citation.volume | 27 | - |
dc.citation.issue | 47 | - |
dc.citation.publicationname | NANOTECHNOLOGY | - |
dc.identifier.doi | 10.1088/0957-4484/27/47/475301 | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | ultraviolet-nanoimprint lithography | - |
dc.subject.keywordAuthor | Wolff rearrangement | - |
dc.subject.keywordAuthor | diazoketo | - |
dc.subject.keywordAuthor | replica mold | - |
dc.subject.keywordAuthor | polyhedral oligomeric silsesquioxane | - |
dc.subject.keywordAuthor | hybrid resist | - |
dc.subject.keywordPlus | NANO-IMPRINT LITHOGRAPHY | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | MONOMERS | - |
dc.subject.keywordPlus | NIL | - |
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