Method for making n-type semiconductor diamondN-형 반도체 다이아몬드의 제조방법

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dc.contributor.authorYu, Jinko
dc.contributor.authorLee, Woong Sunko
dc.contributor.authorKim, Jung Keunko
dc.date.accessioned2017-12-20T12:30:41Z-
dc.date.available2017-12-20T12:30:41Z-
dc.date.issued2000-08-01-
dc.identifier.urihttp://hdl.handle.net/10203/235911-
dc.description.abstractA method for making n-type semiconducting diamond by use of CVD in which n-type impurities are doped simultaneously with the deposition of diamond. As the n-type impurities, an Li compound and a B compound, both, are used at once. After doping, a diamond film thus obtained is etched to peel off its surface. The n-type semiconducting diamond is superior in specific resistivity, 10.sup.-2 .OMEGA.cm or less.-
dc.titleMethod for making n-type semiconductor diamond-
dc.title.alternativeN-형 반도체 다이아몬드의 제조방법-
dc.typePatent-
dc.type.rimsPAT-
dc.contributor.localauthorYu, Jin-
dc.contributor.nonIdAuthorLee, Woong Sun-
dc.contributor.nonIdAuthorKim, Jung Keun-
dc.contributor.assigneeKAIST-
dc.identifier.iprsType특허-
dc.identifier.patentApplicationNumber09028763-
dc.identifier.patentRegistrationNumber6110276-
dc.date.application1998-02-24-
dc.date.registration2000-08-01-
dc.publisher.countryUS-
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