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Endurance characteristics and degradation mechanism of polysilicon thin film transistor EEPROMs with electron cyclotron resonance NaO-plasma gate oxide

Lee, NI; Lee, JW; Han, Chul-Hi, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.38, no.4B, pp.2215 - 2218, 1999-04

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