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Effects of Bottom Polysilicon Doping on the Reliability of Interpoly Oxide Grown by Using Electron Cyclotron Resonance N2O-Plasma N-I Lee; J-W Lee; S-H Hur; H-S Kim; C-H Han, JAPANESE JOURNAL OF APPLIED PHYSICS, v.37, no.3B, pp.1125 - 1128, 1998-01 |
Short-Channel Effects in n- and p-Channel Polycrystalline silicon Thin Film Transistors with Very Thin Electron Cyclotron Resonance N2O- Plasma Gate Dielectric J-W Lee; N-I Lee; C-H Han, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1, v.37, no.3B, pp.1047 - 1049, 1998-01 |
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