Fabrication of a bunch of sub-30-nm nanofibers inside microchannels using photopolymerization via a long exposure technique

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dc.contributor.authorPark, Sang Huko
dc.contributor.authorLim, Tae Wooko
dc.contributor.authorYang, Dong-Yolko
dc.contributor.authorCho, Nam Chulko
dc.contributor.authorLee, Kwang-Supko
dc.date.accessioned2007-12-10T02:10:31Z-
dc.date.available2007-12-10T02:10:31Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2006-10-
dc.identifier.citationAPPLIED PHYSICS LETTERS, v.89, no.17-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10203/2344-
dc.description.abstractExperimental studies on the fabrication of sub-30-nm nanofibers using two-photon initiated photopolymerization (TPP) have been carried out. To generate nanofibers at the interior region of microstructures, a photopolymerization method involving a long laser-exposure technique (LET) is proposed. A multitude of nanofibers with a notably high resolution (about 22 nm) in TPP were produced using the LET. Furthermore, it is also demonstrated that thin interconnecting networks were created regularly in a weakly polymerized region existing around the boundary of a densely polymerized voxel, allowing for the creation of various embossing patterns. By controlling the distance between adjacent voxels or lines, a selective generation of nanofibers in a local area is possible, which leads to the fabrication of high-functional filters and mixers. Embossing patterns and microchannels including nanofibers inside were fabricated by the LET so as to demonstrate the practical feasibility of this approach. These sub-30-nm nanofibers may find meaningful applications such as biofilters, mixers, and photon emitters in diverse research fields. (c) 2006 American Institute of Physics.-
dc.languageEnglish-
dc.language.isoen_USen
dc.publisherAMER INST PHYSICS-
dc.subject2-PHOTON POLYMERIZATION-
dc.subjectMICROFABRICATION-
dc.subjectNANOFABRICATION-
dc.subjectRESOLUTION-
dc.titleFabrication of a bunch of sub-30-nm nanofibers inside microchannels using photopolymerization via a long exposure technique-
dc.typeArticle-
dc.identifier.wosid000241585800123-
dc.identifier.scopusid2-s2.0-33750456135-
dc.type.rimsART-
dc.citation.volume89-
dc.citation.issue17-
dc.citation.publicationnameAPPLIED PHYSICS LETTERS-
dc.identifier.doi10.1063/1.2363956-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorYang, Dong-Yol-
dc.contributor.nonIdAuthorPark, Sang Hu-
dc.contributor.nonIdAuthorLim, Tae Woo-
dc.contributor.nonIdAuthorCho, Nam Chul-
dc.contributor.nonIdAuthorLee, Kwang-Sup-
dc.type.journalArticleArticle-
dc.subject.keywordPlus2-PHOTON POLYMERIZATION-
dc.subject.keywordPlusMICROFABRICATION-
dc.subject.keywordPlusNANOFABRICATION-
dc.subject.keywordPlusRESOLUTION-
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