DC Field | Value | Language |
---|---|---|
dc.contributor.author | Yoon, Jun-Bo | ko |
dc.contributor.author | Lee, Young-Jae | ko |
dc.contributor.author | Yoo, Kyoung Jong | ko |
dc.contributor.author | Kim, Jin Su | ko |
dc.contributor.author | Lee, Jun | ko |
dc.contributor.author | Lee, Yong In | ko |
dc.contributor.author | Yeon, Jeong ho | ko |
dc.contributor.author | Lee, Joo-hyung | ko |
dc.contributor.author | Lee, Jeong Oen | ko |
dc.date.accessioned | 2017-12-20T10:59:41Z | - |
dc.date.available | 2017-12-20T10:59:41Z | - |
dc.date.issued | 2015-02-17 | - |
dc.identifier.uri | http://hdl.handle.net/10203/233211 | - |
dc.description.abstract | A method for fabricating a large-area nanoscale pattern includes: forming multilayer main thin films isolated by passivation layers; patterning a first main thin film to form a first main pattern; forming a first spacer pattern with respect to the first main pattern; and forming a second main pattern by transferring the first spacer pattern onto a second main thin film. By using multilayer main thin films isolated by different passivation films, spacer lithography capable of reducing a pattern pitch can be repetitively performed, and the pattern pitch is repetitively reduced without shape distortion after formation of micrometer-scale patterns, thereby forming nanometer-scale fine patterns uniformly over a wide area. | - |
dc.title | METHOD FOR FABRICATING LARGE-AREA NANOSCALE PATTERN | - |
dc.title.alternative | 대면적 나노스케일 패턴 형성방법 | - |
dc.type | Patent | - |
dc.type.rims | PAT | - |
dc.contributor.localauthor | Yoon, Jun-Bo | - |
dc.contributor.nonIdAuthor | Lee, Young-Jae | - |
dc.contributor.nonIdAuthor | Yoo, Kyoung Jong | - |
dc.contributor.nonIdAuthor | Kim, Jin Su | - |
dc.contributor.nonIdAuthor | Lee, Jun | - |
dc.contributor.nonIdAuthor | Lee, Yong In | - |
dc.contributor.nonIdAuthor | Yeon, Jeong ho | - |
dc.contributor.nonIdAuthor | Lee, Joo-hyung | - |
dc.contributor.nonIdAuthor | Lee, Jeong Oen | - |
dc.contributor.assignee | KAIST | - |
dc.identifier.iprsType | 특허 | - |
dc.identifier.patentApplicationNumber | 13242331 | - |
dc.identifier.patentRegistrationNumber | 08956962 | - |
dc.date.application | 2011-09-23 | - |
dc.date.registration | 2015-02-17 | - |
dc.publisher.country | US | - |
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