Method for patterning nanomaterial using solution evaporation용액 증발법을 이용한 나노물질의 배열방법
Disclosed is a method for patterning a nanomaterial using solution evaporation. More particularly, the method for patterning a nanomaterial using solution evaporation includes; coating the nanomaterial with a polymer material and uniformly dispersing the coated nanomaterial in a solvent to prepare a solution containing the nanomaterial, and pouring the nanomaterial-containing solution on a substrate, enabling the nanomaterial to be patterned after evaporation of the solvent.
- Assignee
- KAIST
- Country
- US (United States)
- Issue Date
- 2014-06-24
- Application Date
- 2009-02-03
- Application Number
- 13140879
- Registration Date
- 2014-06-24
- Registration Number
- 8758852
- Appears in Collection
- EEW-Patent(특허)
- Files in This Item
- There are no files associated with this item.
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