DC Field | Value | Language |
---|---|---|
dc.contributor.author | 김상욱 | ko |
dc.contributor.author | 김경택 | ko |
dc.contributor.author | 김현우 | ko |
dc.contributor.author | 이시용 | ko |
dc.contributor.author | 최성운 | ko |
dc.date.accessioned | 2017-12-20T01:26:42Z | - |
dc.date.available | 2017-12-20T01:26:42Z | - |
dc.date.issued | 2014-11-01 | - |
dc.identifier.uri | http://hdl.handle.net/10203/229736 | - |
dc.description.abstract | A method of patterning a substrate includes processing first regions of the substrate to form a first pattern, the first regions defining a second region between adjacent first regions, arranging a block copolymer on the first and second regions, the block copolymer including a first component and a second component, the first component of the block copolymer being aligned on the first regions, and selectively removing one of the first component and the second component of the block copolymer to form a second pattern having a pitch that is less than a pitch of a first region and an adjacent second region. | - |
dc.title | METHOD OF FORMING FINE PATTERNS USING A BLOCK COPOLYMER | - |
dc.title.alternative | 블록 공중합체의 자기조립 구조를 이용한 패턴형성과 이를 통한 반도체 미세구조의 자동적 패턴밀도 증가 방법 | - |
dc.type | Patent | - |
dc.type.rims | PAT | - |
dc.contributor.localauthor | 김상욱 | - |
dc.contributor.nonIdAuthor | 김경택 | - |
dc.contributor.nonIdAuthor | 김현우 | - |
dc.contributor.nonIdAuthor | 이시용 | - |
dc.contributor.nonIdAuthor | 최성운 | - |
dc.contributor.assignee | KAIST, SAMSUNG ELECTRONICS CO LTD | - |
dc.identifier.iprsType | 특허 | - |
dc.identifier.patentApplicationNumber | 2008125953 | - |
dc.identifier.patentRegistrationNumber | I459437 | - |
dc.date.application | 2008-07-09 | - |
dc.date.registration | 2014-11-01 | - |
dc.publisher.country | CH | - |
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