Flexible and Robust Superomniphobic Surfaces Created by Localized Photofluidization of Azopolymer Pillars

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dc.contributor.authorChoi, Jaehoko
dc.contributor.authorJo, Wonheeko
dc.contributor.authorLee, Seung Yeolko
dc.contributor.authorJung, Yeon Sikko
dc.contributor.authorKim, Shin-Hyunko
dc.contributor.authorKim, Hee-Takko
dc.date.accessioned2017-09-25T06:03:38Z-
dc.date.available2017-09-25T06:03:38Z-
dc.date.created2017-09-18-
dc.date.created2017-09-18-
dc.date.issued2017-08-
dc.identifier.citationACS NANO, v.11, no.8, pp.7821 - 7828-
dc.identifier.issn1936-0851-
dc.identifier.urihttp://hdl.handle.net/10203/226150-
dc.description.abstractSpringtails, insects which breathe through their skins, possess mushroom-shaped nanostructures. As doubly re-entrant geometry, in the mushroom-head enhances the resistance against liquid invasion, the springtails have robust, liquid-free omniphobic skins. Although omniphobic surfaces are promising for various applications, it remains an important challenge to mimic the structural feature of springtails. This paper presents a pragniatic method to create doubly re-entrant nanostructures and robust superomniphobic surfaces by exploiting localized photofluidization of azopolymers. Irradiation of circularly polarized light reconfigures azopolymer micropillars to have a mushroom-like head with a doubly re-entrant nanogeometry through protrusion and inward bending of polymer film from the top edge. The light-driven reconfigured micropillars facilitate the pining of triple line as springtails do. In particular, the unique geometry exhibits superomniphobicity even for liquids whose equilibrium contact angles are almost zero in the presence of a practical level of external pressure. In addition, the simple fabrication process is highly reproducible, scalable, and compatible with various substrate materials including flexible polymeric film. Our results suggest that our photofluidization technology will provide a practical route to develop robust superomniphobic surfaces.-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.subjectAZO POLYMER-FILMS-
dc.subjectDIRECTIONAL PHOTOFLUIDIZATION-
dc.subjectSUPEROLEOPHOBIC SURFACES-
dc.subjectAZOBENZENE MATERIALS-
dc.subjectOMNIPHOBIC SURFACES-
dc.subjectINVERSE OPALS-
dc.subjectTRANSPARENT-
dc.subjectCOATINGS-
dc.subjectFABRICS-
dc.subjectLITHOGRAPHY-
dc.titleFlexible and Robust Superomniphobic Surfaces Created by Localized Photofluidization of Azopolymer Pillars-
dc.typeArticle-
dc.identifier.wosid000408520900031-
dc.identifier.scopusid2-s2.0-85028513888-
dc.type.rimsART-
dc.citation.volume11-
dc.citation.issue8-
dc.citation.beginningpage7821-
dc.citation.endingpage7828-
dc.citation.publicationnameACS NANO-
dc.identifier.doi10.1021/acsnano.7b01783-
dc.contributor.localauthorJung, Yeon Sik-
dc.contributor.localauthorKim, Shin-Hyun-
dc.contributor.localauthorKim, Hee-Tak-
dc.contributor.nonIdAuthorChoi, Jaeho-
dc.contributor.nonIdAuthorJo, Wonhee-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorsuperomniphobic-
dc.subject.keywordAuthordoubly re-entrant geometry-
dc.subject.keywordAuthorlocalized photofluidization-
dc.subject.keywordAuthorazopolymer-
dc.subject.keywordAuthormicro/nanopatterning-
dc.subject.keywordPlusAZO POLYMER-FILMS-
dc.subject.keywordPlusDIRECTIONAL PHOTOFLUIDIZATION-
dc.subject.keywordPlusSUPEROLEOPHOBIC SURFACES-
dc.subject.keywordPlusAZOBENZENE MATERIALS-
dc.subject.keywordPlusOMNIPHOBIC SURFACES-
dc.subject.keywordPlusINVERSE OPALS-
dc.subject.keywordPlusTRANSPARENT-
dc.subject.keywordPlusCOATINGS-
dc.subject.keywordPlusFABRICS-
dc.subject.keywordPlusLITHOGRAPHY-
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