Floating gate memory based on MoS2 channel and iCVD polymer dielectric with metal nanoparticle charge trapping layer

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dc.contributor.author우명훈ko
dc.contributor.author최성율ko
dc.contributor.author장병철ko
dc.contributor.author최준환ko
dc.contributor.author신광혁ko
dc.contributor.author성혜정ko
dc.contributor.author임성갑ko
dc.date.accessioned2017-09-25T02:44:09Z-
dc.date.available2017-09-25T02:44:09Z-
dc.date.created2017-09-12-
dc.date.issued2017-04-06-
dc.identifier.citation제 4회 한국 그래핀 심포지엄-
dc.identifier.urihttp://hdl.handle.net/10203/225909-
dc.languageEnglish-
dc.publisher제 4회 한국 그래핀 심포지엄-
dc.titleFloating gate memory based on MoS2 channel and iCVD polymer dielectric with metal nanoparticle charge trapping layer-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname제 4회 한국 그래핀 심포지엄-
dc.identifier.conferencecountryKO-
dc.identifier.conferencelocation부여 롯데리조트-
dc.contributor.localauthor임성갑-
dc.contributor.nonIdAuthor우명훈-
dc.contributor.nonIdAuthor최성율-
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CBE-Conference Papers(학술회의논문)
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